发明名称 |
GASVERTEILER FÜR EINE AUSSERAXIALE SPUTTERANLAGE |
摘要 |
An improved device for off-axis magnetron sputter deposition of inorganic oxide compounds having a sputter gun, target, substrate, gas flow means and enclosure chamber wherein the improvement comprises a hollow gas flow manifold positioned between the substrate and the target having at least one gas inlet and at least one outlet opening on the manifold, said outlet opening positioned to direct the gas flow away from the target and in the direction of the substrate, and a process for such deposition are disclosed. |
申请公布号 |
DE69605403(T2) |
申请公布日期 |
2000.07.06 |
申请号 |
DE1996605403T |
申请日期 |
1996.02.05 |
申请人 |
E.I. DU PONT DE NEMOURS AND CO., WILMINGTON |
发明人 |
FACE, DEAN;MYERS, KIRSTEN |
分类号 |
C23C14/34;C23C14/00;C23C14/08;C23C14/35;H01J37/34 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|