| 摘要 |
<p>A photosensitive resin composition characterized as comprising the following components: (1) a photosensitive agent having a methylene-bridged moiety comprising a 1,2-naphtoquinonediazide skeleton and two or more methyl-substituted derivatives of phenol in the structure thereof, (2) a polymer having a hydroxyl group and a carboxyl group, or a combination of a polymer having a hydroxyl group and a polymer having a carboxyl group, (3) crosslinking agent capable of crosslinking a hydroxyl group and a carboxyl group, and (4) a solvent. The photosensitive resin composition can be used for providing a pattern which has high transparency and high contrast.</p> |
