SINGLE CHIP PHOTOMASK HAVING ALIGNMENT MARK IN PATTERN PORTION

摘要

PURPOSE: A single chip photomask having an alignment mark in a pattern portion is provided to enhance the productivity with the reduction of alignment errors by providing an alignment mark in a pattern portion. CONSTITUTION: A single chip photomask(100) has a pattern portion(112) formed with Cr on the center of a transparent substrate(111). The substrate(111) around the pattern portion(112) is a scribe line(113) corresponding to a scribe line of a wafer when the pattern is transferred on the wafer. Alignment marks(114, 116) are formed on the scribe line(113) and the pattern portion(112) to be used in aligning the single chip photomask(100) and the wafer in the photolithographic process. The alignment mark(116) is formed in the pattern portion(112) in the single chip photomask(100).