| 摘要 |
<p>A spin coating method and apparatus for forming a thin film having a uniform film thickness on a substrate at a low cost in a production process of semiconductors, optical disks, etc. A coating solution is dripped from a discharge nozzle (4) onto the surface of a substrate (2) to be coated, which is placed on a horizontal turn table (3), and a thin film is formed by turning the substrate. After the coating solution is dripped from the nozzle, the distal end portion (4a) of the nozzle on stand-by is immersed into a nozzle immersing solution (10) having a composition approximate, or equal, to the composition of the coating solution and held in this solution. Consequently, crystal deposition of the solute can be suppressed, and this method is particularly useful for applying a solution containing a solute having high crystallinity. <IMAGE></p> |
