发明名称 |
Selective silicidation process in non-volatile semiconductor memory devices |
摘要 |
<p>A selective silicidation process for electronic devices (1) integrated on a semiconductor substrate (2), said devices (1) comprising a plurality of active elements (3) formed with gate regions (4) which comprise at least one polysilicon layer (5), comprises the following steps: depositing a dielectric layer (6) over the entire surface of the semiconductor; removing said dielectric layer (6) to expose the polysilicon layer (5) of said gate regions (4); depositing a layer of a transition metal (7); subjecting the transition metal layer to a thermal treatment for selectively reacting it with the polysilicon layers and producing a silicide layer (8) over said gate regions (4). <IMAGE> <IMAGE></p> |
申请公布号 |
EP1017088(A1) |
申请公布日期 |
2000.07.05 |
申请号 |
EP19980830793 |
申请日期 |
1998.12.29 |
申请人 |
STMICROELECTRONICS S.R.L. |
发明人 |
FONTANA, GABRIELLA;PIVIDORI, LUCA |
分类号 |
H01L21/8247;H01L21/28;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L21/28;H01L21/823 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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