发明名称 HEAVILY DOPED QUANTUM WIRE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A method for manufacturing a quantum wire is provided to obtain a quantum wire which has a better physical characteristics than a quantum well device. CONSTITUTION: A photosensitive layer is coated on an N-type semiconductor material, and then the photosensitive layer is patterned. The N-type semiconductor material is etched to form a V-shaped substrate. Then, the photosensitive pattern is removed. The V-shaped substrate is loaded on depositing equipment. A well layer that has a thickness, which is equal to the width of the upper surface of the V-shaped recess, is formed. A P-type semiconductor layer is formed on the above-mentioned structure.
申请公布号 KR20000037777(A) 申请公布日期 2000.07.05
申请号 KR19980052526 申请日期 1998.12.02
申请人 KOREA ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, SEONG BOK;NO, JEONG RAE;PARK, GYUNG WAN
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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