发明名称 |
HEAVILY DOPED QUANTUM WIRE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A method for manufacturing a quantum wire is provided to obtain a quantum wire which has a better physical characteristics than a quantum well device. CONSTITUTION: A photosensitive layer is coated on an N-type semiconductor material, and then the photosensitive layer is patterned. The N-type semiconductor material is etched to form a V-shaped substrate. Then, the photosensitive pattern is removed. The V-shaped substrate is loaded on depositing equipment. A well layer that has a thickness, which is equal to the width of the upper surface of the V-shaped recess, is formed. A P-type semiconductor layer is formed on the above-mentioned structure.
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申请公布号 |
KR20000037777(A) |
申请公布日期 |
2000.07.05 |
申请号 |
KR19980052526 |
申请日期 |
1998.12.02 |
申请人 |
KOREA ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KIM, SEONG BOK;NO, JEONG RAE;PARK, GYUNG WAN |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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地址 |
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