PHOTORESIST COATING METHOD FOR FORMING FINE CONTACT HOLE

摘要

PURPOSE: A photoresist coating method for forming a fine contact hole is provided to improve a thermal characteristic of a deep-ultraviolet type photoresist. CONSTITUTION: A photoresist coating method for forming a fine contact hole comprises coating a deep-ultraviolet type photoresist, exposing the photoresist, post exposure bake treating, developing the photoresist to form a fine contact hole, wherein the deep-ultraviolet type photoresist contains a low molecular substance. The low molecular substance has a range of glass transition temperature, which does not affect the thermal stability of the photoresist.