发明名称 |
THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A thin film transistor and a method for fabricating the thin film transistor are provided to simplify the manufacturing process of the thin film transistor by forming the offset area and source/drain area through the self align process without using a mask. CONSTITUTION: An insulation layer(22) is formed on two areas which are defined on a semiconductor substrate(21). A body poly layer(23) is formed on the semiconductor substrate(21). The body poly layer(23) has a drain formed on a higher insulation layer, an offset area which is formed on a side of the higher insulation layer, a channel area which is formed on a lower insulation layer and a source which is aligned in the channel area. A gate oxide film is formed on the channel area of the body poly layer(23). A gate electrode layer(30) is formed on the channel area of the body poly layer(23).
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申请公布号 |
KR20000038333(A) |
申请公布日期 |
2000.07.05 |
申请号 |
KR19980053293 |
申请日期 |
1998.12.05 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
LEE, SANG HO |
分类号 |
H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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