APPARATUS FOR WAFER MARKING AND EXPOSURE

摘要

PURPOSE: An apparatus for wafer marking and exposure is provided to proceed a process for coating photoresist and a process for developing it at the same time. CONSTITUTION: An apparatus for wafer marking and exposure comprises an optical cable(3) branching off a portion of light radiated from a light source(1), a film(7) having characters on it to project the characters on a wafer(11), a lens(9) imaging the film(7) on the wafer(11), a lens moving device(13) for moving the lens(9) in the direction of the axis of light to bring into focus.