发明名称 |
NEW FILLING METHOD FOR THROUGH HOLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method in which an opening in a substrate such as a through hole or the like is filled. SOLUTION: An epoxy resin-based dielectric film 16 which covers an opening 14 is arranged on a substrate 12 which comprises the opening 14. The dielectric film 16 is made to reflow so as to flow into the opening 14. A continuous dielectric which is extended into the opening 14 from the dielectric film 16 is formed. When a via 18 is formed after the opening 14 is filled, light is image-formed on the dielectric film 16, the via 18 is metallized, and a circuit structure 24 is formed. It is preferable that the dielectric film 16 contains 0 to 50% of inorganic fine particles, 50 to 100% of an epoxy resin and a cation photoinhibitor of 0.1 to 15 pts.wt. in terms of the total weight of the resin are contained. |
申请公布号 |
JP2000188473(A) |
申请公布日期 |
2000.07.04 |
申请号 |
JP19990242104 |
申请日期 |
1999.08.27 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
LAUFFER JOHN M;VOYA R MARKOVICH;CHERIRU L PAROMAKI;WILLIAM E WILSON |
分类号 |
H05K3/42;C08L63/00;C08L101/12;C09D5/34;C09D163/00;H01B3/40;H05K1/11;H05K3/00;H05K3/46;(IPC1-7):H05K3/42 |
主分类号 |
H05K3/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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