发明名称 NEW FILLING METHOD FOR THROUGH HOLE
摘要 PROBLEM TO BE SOLVED: To provide a method in which an opening in a substrate such as a through hole or the like is filled. SOLUTION: An epoxy resin-based dielectric film 16 which covers an opening 14 is arranged on a substrate 12 which comprises the opening 14. The dielectric film 16 is made to reflow so as to flow into the opening 14. A continuous dielectric which is extended into the opening 14 from the dielectric film 16 is formed. When a via 18 is formed after the opening 14 is filled, light is image-formed on the dielectric film 16, the via 18 is metallized, and a circuit structure 24 is formed. It is preferable that the dielectric film 16 contains 0 to 50% of inorganic fine particles, 50 to 100% of an epoxy resin and a cation photoinhibitor of 0.1 to 15 pts.wt. in terms of the total weight of the resin are contained.
申请公布号 JP2000188473(A) 申请公布日期 2000.07.04
申请号 JP19990242104 申请日期 1999.08.27
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 LAUFFER JOHN M;VOYA R MARKOVICH;CHERIRU L PAROMAKI;WILLIAM E WILSON
分类号 H05K3/42;C08L63/00;C08L101/12;C09D5/34;C09D163/00;H01B3/40;H05K1/11;H05K3/00;H05K3/46;(IPC1-7):H05K3/42 主分类号 H05K3/42
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