发明名称 Process and equipment for rejuvenation treatment of photoresist development waste
摘要 The disclosed process for rejuvenation treatment of a photoresist development waste mainly containing a photoresist and tetraalkylammonium (TAA) ions comprises at least a simple membrane separation step of treating the photoresist development waste or a treated solution derived from the photoresist development waste with a nanofiltration membrane (NF membrane) to obtain a concentrate (NF concentrate) mainly containing impurities such as the photoresist and a higher-purity permeate (NF permeate) mainly containing TAA ions. The NF concentrate and/or the NF permeate, preferably the NF permeate, is desirably subjected to a step of concentration and refining by electrodialysis or electrolysis and/or a step of refining by ion exchange treatment, for example, with an anion exchange resin and/or a cation exchange resin in one of the H form and the TAA form. The NF permeate may advantageously be passed through the concentrating cells of an electrodialysis unit while passing the NF concentrate through the desalting cells of the electrodialysis unit to further recover TAA ions remaining in the NF concentrate, whereby the amount of wastewater discharged as the desalted waste can be decreased. The NF membrane separation step is preferably effected in multiple stages.
申请公布号 US6083670(A) 申请公布日期 2000.07.04
申请号 US19980217280 申请日期 1998.12.21
申请人 ORGANO CORPORATION 发明人 SUGAWARA, HIROSHI;HENMI, HIROMI
分类号 B01D15/08;B01D61/02;B01D61/04;B01D61/08;B01D61/14;B01D61/16;B01D61/18;B01D61/58;B01J39/04;B01J41/04;C02F1/04;C02F1/26;C02F1/42;C02F1/44;C02F1/461;C02F1/469;C02F1/58;C02F9/00;G03F7/30;G03F7/32;(IPC1-7):G03C5/31 主分类号 B01D15/08
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