| 摘要 |
PROBLEM TO BE SOLVED: To prepare, in short time, a sample for total reflection fluorescent X-ray analysis, when the sample for the total reflection fluorescent X-ray analysis is prepared by concentrating, or evaporated to dryness in some cases, a HF solution drop used for collection and recovery of surface impurities on a semiconductor substrate such as an Si wafer. SOLUTION: This concentration for HF solution drop 22 containing recovered semiconductor substrate surface impurities has a concentration processing chamber 1 for storing a semiconductor substrate 21 which is deposited with the HF drop 22 containing the recovered impurities to conduct concentration processing, a heating plate 2 for holding and heating the semiconductor substrate 21 inside the chamber 1, a gas inlet pipe 3 attached to the chamber 1 for introducing inert gas into the chamber 1, and a decompression device 4 for pressure reducing the inside of the chamber 1.
|
