发明名称 Method of forming an alignment mark
摘要 An alignment mark (51) is formed on the surface (64) of a silicon carbide substrate (50). The alignment mark (51) is used to reflect a light signal (72) to determine the proper position for the silicon carbide substrate (50). The materials that are used to form the alignment mark (51) can be used to form an alignment mark on any transparent or semi-transparent substrate and will maintain physical integrity through very high temperature processing steps.
申请公布号 US6083806(A) 申请公布日期 2000.07.04
申请号 US19980110352 申请日期 1998.07.06
申请人 MOTOROLA, INC. 发明人 MANCINI, DAVID P.;RESNICK, DOUGLAS J.;TOMPKINS, HARLAND G.;MOORE, KAREN E.
分类号 G03F9/00;H01L23/544;(IPC1-7):H01L21/76 主分类号 G03F9/00
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