发明名称 Electrostatic discharge protective circuit for semiconductor device
摘要 An electrostatic discharge protective circuit including a semiconductor substrate, an input/output pad formed on the semiconductor substrate, a PMOS transistor formed on the semiconductor substrate and having a drain connected to the input/output pad, a first n+ diffusion layer formed in the semiconductor substrate and separated from the drain of the PMOS transistor at a predetermined interval while being connected to a Vcc terminal, a deep n+ diffusion layer formed between the drain of the PMOS transistor and the first n+ diffusion layer, an NMOS transistor formed on the semiconductor substrate and having a drain connected to the input/output pad, and second n+ diffusion layers formed around the NMOS transistor in the semiconductor substrate and connected to a Vss terminal.
申请公布号 US6084272(A) 申请公布日期 2000.07.04
申请号 US19990263527 申请日期 1999.03.05
申请人 LG SEMICON CO., LTD. 发明人 JUNG, HYUCK-CHAI
分类号 H01L21/8238;H01L27/02;H01L27/092;(IPC1-7):H01L27/01;H01L27/12 主分类号 H01L21/8238
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