| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern-forming apparatus and coating/developing apparatus, which can inexpensively dispense with fine temperature adjustment. SOLUTION: A coating/developing apparatus 5 for coating a resist solution on a substrate and for developing the substrate, after being subjected to light exposure is connected to an aligner 6 through an interface 4. Then the aligner 6 is connected with the interface 4 via a duct 42 to communicate therewith, so that a clean air having an adjusted temperature supplied from the outside into the aligner 6 is also supplied, even into the interface 4 from the aligner 6 via the duct 42. Thereby the inside atmosphere of the interface can be adjusted to have the same atmospheric temperature as in the aligner 6, while eliminating the need for fine temperature adjustment within the interface 4. |
