发明名称 PHOTOPOLYMERIZABLE COMPOSITION, IMAGE FORMING MATERIAL AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photopolymerizable composition high in sensitivity and good in developability and solubility in a solvent and restrained from deterioration after long-term storage. SOLUTION: The photopolymerizable composition comprises (A) a monomer having an additionally polymerizable ethylenically unsaturated double bond, (B) a photopolymerization initiator, containing at least one kind of radical activator and an amino-acidamide represented by the general formula I, and/or its condensation product, and (C) a polymer binder, and in formula I, (n) is an integer of 2-10; each of R1-R5 is, independently, an H atom or an optionally substituted alkyl group or the like; and each of of R6, R71, R72, R81, and R82 is an H atom or an optionally substituted alkyl group or the like.
申请公布号 JP2000187323(A) 申请公布日期 2000.07.04
申请号 JP19980366565 申请日期 1998.12.24
申请人 MITSUBISHI CHEMICALS CORP 发明人 HINO ETSUKO;URANO TOSHIYOSHI;NAGAO TAKUMI
分类号 G03F7/027;C08F2/44;C08F2/50;G02B5/20;G03F7/00;G03F7/028;G03F7/032;G03F7/11 主分类号 G03F7/027
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