发明名称 TRANSPARENT GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a transparent gas barrier film excellent in efficiency and grade reconciled with the transparency and gas barrier properties of an aluminum oxide vapor deposition layers which has been contrary to each other heretofore. SOLUTION: A transparent gas barrier film is constituted by forming a protective layer on the vapor deposition layer of a vapor deposition film, wherein an aluminum oxide vapor deposition layer is formed on a base plastic film so that the total light transmissivity of the base plastic film becomes 95-98% after the vapor deposition of aluminum oxide when the total light transmissivity of the base plastic film is set to 100%, by coating the vapor deposition layer with an aq. soln. or dispersion of a gas barrier resin wherein at least one of oxygen permeability (unit cc/m2/day) and steam permeability (unit g/m2/day) is 100 or less when the resin is formed into a film with a thickness of 10μm. In this case, the total light transmissivity of this film is set to 100% or more when that of the base plastic film is set to 100%.
申请公布号 JP2000185364(A) 申请公布日期 2000.07.04
申请号 JP19980376315 申请日期 1998.12.22
申请人 TOYO METALLIZING CO LTD 发明人 TERANISHI MASAYOSHI;WATANABE HIDEO
分类号 B32B9/00;(IPC1-7):B32B9/00 主分类号 B32B9/00
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