Polymer mixture for photoresist and photoresist composition containing the same

摘要

A polymer mixture for a photoresist composition, and a photoresist composition containing the polymer mixture. The polymer mixture includes a polymer that has two or more different monomers and an acid-labile di-alkylmalonate group bound to the backbone of the polymer; a polymer that has a monomer of (meth)acrylate derivative and one or more other monomers; or a polymer that has a monomer of alkoxystyrene and one or more other monomers. The polymer mixtures are suitable for forming photoresist compositions that generate a pattern having an excellent profile, due to the high contrast and high thermal decomposition temperature of the photoresist composition. The photoresist composition of the present invention further include a photosensitive acid generator.