发明名称 ROTARY SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a small-sized rotary substrate treating device which can prevent the re-adhesion of a treating solution to a substrate, while the running cost required for the treatment of the substrate is suppressed to a low value. SOLUTION: Heaters 20 are respectively attached to cups 18 and the drive of the heaters 20 is controlled by means of a heater controller 22. Since the cups 18 are heated by the heaters 20, droplets scattered from a rotating substrate S toward the internal surfaces 18a of the cups 18 are evaporated instantaneously or before next droplets are scattered, and the droplets which come into collision with the cups 18 can be prevented from returning to the substrate S side and again adhering to the surface of the substrate S.
申请公布号 JP2000188276(A) 申请公布日期 2000.07.04
申请号 JP19980362573 申请日期 1998.12.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KIYOSE HIROMI
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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