| 摘要 |
PROBLEM TO BE SOLVED: To provide a stencil mask which can simplify the processes and provides improved resolution by decreasing the thickness of a silicon layer as an absorbing or scattering layer in the mask. SOLUTION: This stencil mask is used as a light exposure mask in a non- optical exposure step using an electron beam, X-ray or ion beam as a light source. The mask includes a membrane 32a and an absorbing or scattering layer formed on the membrane for absorbing or scattering the electrons. The absorbing and scattering layers are made of different substances and are each of a multilayer structure having at least 2 or more layers. |
