| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having extremely high barrier properties, a method for simply producing the gas barrier film, and a laminated material using this gas barrier film. SOLUTION: A gas barrier film is constituted by providing a metal film 3 and a metal oxide film 4 formed by anodically oxidizing the metal film 3 on at least one surface of a base material film 2. In this case, the oxygen gas permeability of the gas barrier film is set to 0.3 [cc/m2/day] or less and the steam permeability thereof is set to 0.3 [g/m2/day] or less. This gas barrier film is produced by forming the metal film 3 on at least one surface of the base material film 2 by either one of a vacuum vapor deposition method, an ion plating method, a sputtering method and a chemical vapor deposition method and forming the metal oxide film 4 due to anodic oxidation on the metal film by a method wherein the metal film 3 is dipped in an anodic oxidation soln. in a state connected to the anode of an external power supply to be opposed to a cathode and a current is applied across the anode and the cathode.
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