发明名称 Bi-level digit line architecture for high density DRAMS
摘要 There is a bi-level bit line architecture. Specifically, there is a DRAM memory cell and cell array that allows for six square feature area (6F2) cell sizes and avoids the signal to noise problems. Uniquely, the digit lines are designed to lie on top of each other like a double decker overpass road. Additionally, this design allows each digit line to be routed on both conductor layers, for equal lengths of the array, to provide balanced impedance. Now noise will appear as a common mode noise on both lines, and not as differential mode noise that would degrade the sensing operation. Furthermore, digit to digit coupling is nearly eliminated because of the twist design.
申请公布号 US6084307(A) 申请公布日期 2000.07.04
申请号 US19980211662 申请日期 1998.12.15
申请人 MICRON TECHNOLOGY, INC. 发明人 KEETH, BRENT
分类号 H01L21/8242;H01L23/522;H01L27/108;(IPC1-7):H01L27/10 主分类号 H01L21/8242
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