发明名称 |
Photopolymerizable, coatable organosol and method |
摘要 |
Photopolymerizable plastisol and organosol photoresist and solder mask coating compositions are described herein. These compositions include an ethylenically unsaturated photopolymerizable liquid plasticizer; a particulate, thermoplastic resin is dispersed in the plasticizer, the said resin having a midpoint Tg greater than 110 DEG C. and an acid number greater than 110; a tertiary amine stabilizer; and a photoinitiator. The organosol includes a diluent along with the other ingredients.
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申请公布号 |
US6083660(A) |
申请公布日期 |
2000.07.04 |
申请号 |
US19950439548 |
申请日期 |
1995.05.11 |
申请人 |
ARMSTRONG WORLD INDUSTRIES, INC. |
发明人 |
EHRHART, WENDELL A.;SMITH, DAVID A. |
分类号 |
G03F7/033;(IPC1-7):G03C1/73;C08J5/34;C08J5/17;C08L5/17 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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