| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam mapping projection optical system and an adjustment method thereof capable of accurately and rapidly adjusting the Wien condition of E×B. SOLUTION: In a first process, a radiation source for adjustment 1 for emitting a charged particle beam far adjustment T is arranged in a position of a sample surface 30. In a second process, an applied voltage of optical path switching means 6 is adjusted so that an image formed on detecting means 14 by the radiation source for adjustment 1 when a voltage is not applied to the optical path switching means 6, and an image formed on the detecting means 14 by the radiation source for adjustment 1 when a voltage is applied are matched with each other.
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