| 摘要 |
PURPOSE:To allow easy independent determination of firing and developing conditions of resist film irrespective of the exposing conditions by determining the firing and developing conditions when a resist film fired under each firing condition without subjecting to exposure exhibits a desired disolution trend at the time of each development. CONSTITUTION:A plurality of resist films formed on a substrate are fired under different firing conditions. The resist film fired under each firing condition without subjecting to exposure is then subjected to development for partially dissolving the resist film under specified conditions using a specified developer. Firing conditions of resist film are determined when some resist film exhibits a desired disolution trend. Developing conditions are determined based on the developer conditions of resist film when the solution, obtained by firing the resist film under specified conditions and partially dissolved through development under different developer conditions without subjecting to exposure. |
