发明名称 POWER SUPPLY UNIT FOR SPUTTERING DEVICE
摘要 <p>The present invention is such that, in a circuit for preventing an arc discharge through the application of a reverse voltage pulse, in the case where, after the application of the reverse voltage pulse has been ended, the generation of an arc discharge is detected by an arc discharge detecting means (23), a reverse voltage generated by a reverse voltage generating means (12) is applied within 1 to 10 mu s to a sputtering source to lower the probability of generating a continuous arc discharge and, through a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), a current at a time of applying the reverse voltage is restricted, thus lowering a continuous arc discharge resulting from the reverse arc discharge. &lt;IMAGE&gt;</p>
申请公布号 EP1013792(A1) 申请公布日期 2000.06.28
申请号 EP19980904391 申请日期 1998.02.19
申请人 SHIBAURA MECHATRONICS CORPORATION 发明人 KURIYAMA, NOBORU;YATSU, YUTAKA;KAWAMATA, YOSHIO;FUJII, TAKASHI
分类号 C23C14/34;C23C14/54;H01J37/34;(IPC1-7):C23C14/34;H01L21/285;H01L21/203 主分类号 C23C14/34
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