A wafer holder for use in the target chamber of an ion implantation apparatus comprises a wafer mount (30) and an electrically conductive elastic body (44) that is laid on the wafer mount (30) and has a surface for holding a wafer thereon. This surface can have projections (44a). <IMAGE>
申请公布号
EP1014421(A1)
申请公布日期
2000.06.28
申请号
EP19990310279
申请日期
1999.12.20
申请人
APPLIED MATERIALS, INC.;SHIN-ETSU CHEMICAL COMPANY, LTD.
