| 摘要 |
An insulative shroud retention wafer including a planar base member. There are also first, second, third and fourth cylindrical members which each have an axial pin receiving aperture and an axial center line extending through the pin receiving aperture. These cylindrical members extend from the first side of the planar base member and the cylindrical members are positioned in an arrangement such that a first longitudinal center line extends through the axial center line of the first and second cylindrical members. A second longitudinal center line extends in parallel spaced retention to the first longitudinal center line through the axial center lines of the third and fourth cylindrical members. A first transverse center line extends through the center lines of the first and third cylindrical members. A second traverse center line extends through the center line of the second and fourth cylindrical members. A protuberance is peripherally positioned on the first cylinder at least in part at a position between the first longitudinal center line and the first transverse center line. This arrangement maximizes the number of cylindrical members on the wafer. The wafer may be mounted on a header prior to shipment to the user thus saving the user time and effort in his manufacturing operation. |
