发明名称 Photoresist compositions suitable for deep-UV wavelength imaging
摘要 The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.
申请公布号 EP1014193(A1) 申请公布日期 2000.06.28
申请号 EP19990125625 申请日期 1999.12.22
申请人 SHIPLEY COMPANY LLC 发明人 TREFONAS, PETER, III;TAYLOR, GARY N.
分类号 C08K5/17;C08L101/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 主分类号 C08K5/17
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