发明名称 Nonvolatile semiconductor memory device and method for fabricating the same, and semiconductor integrated circuit device
摘要 In a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first and second surface regions together, a channel region has a triple structure. Thus, a high electric field is formed in a corner portion between the step side region and the second surface region and in the vicinity thereof. A high electric field is also formed in the first surface region. As a result, the efficiency, with which electrons are injected into a floating gate, considerably increases. <IMAGE>
申请公布号 EP0935293(A3) 申请公布日期 2000.06.28
申请号 EP19990100645 申请日期 1999.01.14
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;HALO LSI DESIGN AND DEVICE TECHNOLOGY INC. 发明人 ODANAKA, SHINJI;AKAMATSU, KAORI;KATO, JUNICHI;HORI, ATSUSHI;OGURA, SEIKI
分类号 H01L21/8247;H01L21/28;H01L21/336;H01L27/115;H01L29/423;H01L29/788;H01L29/792 主分类号 H01L21/8247
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