发明名称 |
Nonvolatile semiconductor memory device and method for fabricating the same, and semiconductor integrated circuit device |
摘要 |
In a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first and second surface regions together, a channel region has a triple structure. Thus, a high electric field is formed in a corner portion between the step side region and the second surface region and in the vicinity thereof. A high electric field is also formed in the first surface region. As a result, the efficiency, with which electrons are injected into a floating gate, considerably increases. <IMAGE> |
申请公布号 |
EP0935293(A3) |
申请公布日期 |
2000.06.28 |
申请号 |
EP19990100645 |
申请日期 |
1999.01.14 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;HALO LSI DESIGN AND DEVICE TECHNOLOGY INC. |
发明人 |
ODANAKA, SHINJI;AKAMATSU, KAORI;KATO, JUNICHI;HORI, ATSUSHI;OGURA, SEIKI |
分类号 |
H01L21/8247;H01L21/28;H01L21/336;H01L27/115;H01L29/423;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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