Ion implantation control using charge collection, optical emission spectroscopy and mass analysis

摘要

Apparatus and method for implanting ions into a workpiece surface. A concentration of ions (42) is produced. An optical analysis of the concentration of ions is performed and recorded. The constituency of the ion concentration is determined by comparing the optical analysis data (320) with a database (185) of records on a storage medium wherein the optical analysis data for given concentrations of ions have been stored for subsequent access. Ions from the ion concentration are caused to impact a workpiece surface. The dose of ions implanted into the workpiece (14) is measured. Implantation of the workpiece is stopped once an appropriate dose has been reached.