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发明名称
Chamber etching of plasma processing apparatus
摘要
申请公布号
GB2308231(B)
申请公布日期
2000.06.28
申请号
GB19960025888
申请日期
1996.12.13
申请人
* NEC CORPORATION
发明人
TATSUYA * USAMI
分类号
H05H1/46;C23C16/40;C23C16/44;C23C16/50;C23C16/511;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/469
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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