发明名称 |
Projection lithography using a servo control |
摘要 |
<p>In a photolithography apparatus, accelerations of the lens unit due to vibrational disturbances are measured and used to derive a control signal which is applied to the positioning means of the wafer table and/or mask table, so as to effect compensating motions of that table. This feedforward system can be optimized to correct for motions of the lens unit in specific frequency bands, e.g. in the vicinity of the eigenfrequency of the lens. <IMAGE></p> |
申请公布号 |
EP1014198(A2) |
申请公布日期 |
2000.06.28 |
申请号 |
EP19990310126 |
申请日期 |
1999.12.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
COX, HARRY HENRIKUS HERMAN MARIE;PLUG, REINDER TEUN |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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