发明名称 |
Nonvolatile semiconductor memory device and method of manufacturing the same |
摘要 |
<p>This invention relates to a nonvolatile semiconductor memory capable of electrically rewriting the data. A memory cell transistor formed in an element formation region in a semiconductor substrate (2) has a gate electrode structure including a source/drain diffused layer (9), a gate insulating film (5) formed on the element formation region, a floating gate (6), a gate-to-gate insulating film (7), and a control gate (8). A barrier insulating film (12) for suppressing excess etching is formed above the semiconductor substrate excluding the vicinity of the gate electrode structure. <IMAGE></p> |
申请公布号 |
EP1014448(A2) |
申请公布日期 |
2000.06.28 |
申请号 |
EP19990125534 |
申请日期 |
1999.12.22 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SHIROTA, RIICHIRO;TAKEUCHI, YUJI;KAMIYA, EIJI;MEGURO, HISATAKA;IIZUKA, HIROHISA;ARITOME, SEIICHI;KOIDO, NAOKI;GODA, AKIRA;TSUNODA, HIROAKI |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;(IPC1-7):H01L27/115;H01L21/762;H01L21/824;H01L21/336 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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