| 摘要 |
A catadioptric reduction projection optical system (10, 30) capable of forming a reduced image of a pattern of a reticle (R) on a wafer (W) by scanning the reticle and wafer in a scanning direction (12, 14). The system comprises, in order from a first surface (OP) to a second surface (IP) along a folded optical axis (A), a first optical system (G1) having positive refracting power, and a beam splitter (BS) having a transmissoreflective surface and a reflection optical path and a transmission optical path. The beam splitter is arranged such that the plane of incidence, defined by the folded optical axis, includes the scanning direction. The system also includes a second optical system (G2) comprising a single concave mirror (MC) arranged in one of the reflection optical path and transmission optical path, and a third optical system. The latter has negative refracting power and includes a reflective plane surface (MP). The third optical system arranged in the opposite one of the reflection optical path and the transmission optical path as the second optical system. The system also includes a fourth optical system having positive refracting power. The system also preferably satisfies a number of design conditions.
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