| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a deposition film forming method capable of continuously forming a deposition film having a compositional distribution in the film thickness direction on a substrate of a large area without the variation of characteristics and to provide a deposition film forming device. SOLUTION: In a deposition film forming method or device in which, while is a long substrate 301 is continuously moved in the longitudinal direction in a vacuum vessel 302, a gaseous starting material contg. plural kinds of substrate to form into the raw material of a deposition film and electric power are introduced into the vacuum vessel, and a deposition film is formed on the long substrate, an auxiliary electrode supplying auxiliary electric power to the inside of the vacuum vessel besides the electric power mainly generating plasma is provided, and, in accordance with the position of the electrode supplying the auxiliary electric power, the change of a forbidden hand width in the film thickness direction of the deposition film formed on the long substrate is controlled.</p> |
