发明名称 Method of growing single semiconductor crystal and semiconductor device with single semiconductor crystal
摘要 A semiconductor film deposited on a substrate has regions of different thermal conductivity. A pulsed laser radiation is applied to the semiconductor film to melt the semiconductor film. When the melted semiconductor film is cooled and solidified, localized low-temperature regions are developed in the respective regions of different thermal conductivity. Crystal nuclei are produced in the respective localized low-temperature regions and grown into a single semiconductor crystal. The regions of different thermal conductivity are formed in the semiconductor film by high-thermal-conductivity members deposited on the semiconductor film in thermally coupled relationship thereto. A semiconductor device is fabricated using the semiconductor film and has channels disposed in the vicinity of the crystal nuclei.
申请公布号 US6080239(A) 申请公布日期 2000.06.27
申请号 US19970795338 申请日期 1997.02.04
申请人 SONY CORPORATION 发明人 NOGUCHI, TAKASHI
分类号 H01L21/20;H01L21/336;H01L21/77;H01L29/786;(IPC1-7):C30B25/12 主分类号 H01L21/20
代理机构 代理人
主权项
地址