| 摘要 |
PROBLEM TO BE SOLVED: To normally convey a substrate by providing a shutter part supporting means for supporting the substrate by moving a cover part with larger area than an aperture, with respect to the aperture. SOLUTION: A shutter part supporting means 80A is composed of free rotating rollers 75 and provided between a carrier roller 61 positioned on the uppermost reaches in a conveying direction inside an etching chamber 3, and a carrier roller 62 on the uppermost reaches in the conveying direction inside a washing chamber 4. The uppermost part of the peripheral surface of each free rotating roller 75 is flush with the uppermost part of the peripheral surface of fixed rollers 6c respectively provided at the carrier rollers 61, 62. With this constitution, the uppermost part of the peripheral surface of each free rotating roller 75 coincides with a conveying path P, so that a substrate can be supported by the free rotating rollers 75. When conveyed, the substrate is therefore supported by the free rotating rollers 75 of the shutter part supporting means 80A between the etching chamber 3 and the washing chamber 4. |
