| 摘要 |
Disclosed is an apparatus for removing a coated film from a peripheral portion of a substrate, comprising a section for holding a rectangular substrate horizontal, a surrounding member for surrounding a peripheral portion of the substrate held by the holding section, a discharge section mounted to face an upper peripheral portion of the substrate held by the holding section, rotatable about its longitudinal axis, a supply mechanism for supplying a solvent capable of dissolving the coated film into the solvent discharge section, a discharge rate controller for controlling the discharge rate of the solvent from the discharge section, a rotating mechanism for rotating the discharge section about its longitudinal axis between a first position in which the discharge port faces perpendicularly downward the front surface of the substrate and a second position, a suction mechanism, and control means for controlling the operation of each of the controller and the rotating mechanism.
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