| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject compound useful as a photoresist material, etc., by one-stage process from an industrially readily obtainable inexpensive starting substance in a high yield by reacting a t-butoxystyrene in the presence of a catalyst. SOLUTION: (A) t-Butoxystyrene of formula I is reacted with (C) an acetylating agent in the presence of (B) a catalyst to give a compound of formula II such as o-acetoxystyrene. The component A is reacted by using acetic anhydride as the component C in the presence of at least one kind of polymerization inhibitor such as an acid amide of formula III (R1 is H or a 1-5C alkyl; R2 and R3 are each H, a 1-4C alkyl or phenyl). After the reaction is over, a neutralizing agent composed of an alkali is added to the obtained reaction mixture to neutralize the acid catalyst. Acetic acid and acetic anhydride are recovered by distillation. Preferably the obtained distillation residue is washed with water and distilled in the presence of a substituted phenol.
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