| 摘要 |
PROBLEM TO BE SOLVED: To reduce apparatus costs by downscaling an apparatus by carrying out a plurality of cleaning processes by one unit of apparatus, to improve throughput by shortening a treatment time, and to provide a purified substrate. SOLUTION: An apparatus has the first cleaning mechanism 12 equipped with rollers 16 which are arranged around a substrate, contact the peripheral part of the substrate, and hold and move the substrate, the second cleaning mechanism 14 equipped with a movement mechanism which can move the substrate at a higher speed than the first cleaning mechanism, and a change-over means 60 which changes over the first cleaning mechanism and the second cleaning mechanism.
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