| 摘要 |
An installation for forming a double-sided photomask includes a first and a second particle sources and a first and a second focusing assemblies positioned on each side of a mechanical stage. The mechanical stage is used for holding a masking plate that requires pattern inscription. The particles generated by the first and the second particle sources are channeled to the first and second focusing assemblies, respectively. Within each focusing assembly, the particle beam is focused to a desired resolution for inscribing a pattern onto each face of the masking plate, thereby forming a double-sided photomask. The installation further includes a controlling unit coupled to the particle sources, the focusing assemblies and the mechanical stage for controlling system operation. In addition, there is a photomask pattern generator coupled to the controlling unit for supplying pattern data to the controlling unit.
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