发明名称 APPARATUS FOR MAINTAINING A SUBSTRATE AND A METHOD THEROF
摘要 PURPOSE: An apparatus for maintaining a substrate and a method thereof are provided to improve an electrostatic chuck without accumulating undesired charge. CONSTITUTION: An apparatus for maintaining a substrate includes a chuck body(302), at least one electrode(308), and a barrier layer(312). The at least one electrode(308) are arranged around the chuck body(302). The barrier layer(312) is arranged around the at least one electrode(308). The chuck body(302) of the apparatus for maintaining the substrate is further made of a dielectric material. The dielectric material is further made of aluminum nitride. The at least one electrode(308) is made of a conduction material.
申请公布号 KR20000035641(A) 申请公布日期 2000.06.26
申请号 KR19990052369 申请日期 1999.11.24
申请人 APPLIED MATERIALS INC. 发明人 HAUSMAN GILBERT
分类号 H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 H01L21/68
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