| 摘要 |
PURPOSE: An annealing apparatus is provided to be capable of cleaning efficiently an apparatus for fabricating various kinds of films. CONSTITUTION: An annealing apparatus comprises a reaction tube(11) which receives the processed (15). A ventilation tube(63) is connected to an end of the reaction tube(11), and discharges gas in the reaction tube(11). A discharge gas supply tube(31) is inserted in the reaction tube(11), and supplies reaction gas in the reaction tube(11). An HF gas supply part consists of a pipe(33), a valve(VB6), and an inlet(64). The pipe(33) is connected to a gas source(35d), and the valve(VB6) is installed at the pipe(33) so as to control the supply of hydrogen fluoride from the gas source. The inlet(64) guides the hydrogen fluoride from the gas source through the pipe(33) into the ventilation tube(63) or into the reaction tube(11).
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