| 摘要 |
PURPOSE: A photosensitive composition and a calcined pattern obtained by using the same are provided. The composition is developed by aqueous alkaline solution and shows stability during storing, and has good photo-curing depth in spite of containing a very large quantity of inorganic micro powder and also has excellent stable adherence to the substrate during drying, exposing, developing and calcining. CONSTITUTION: A photosensitive composition comprises (i) 5-30 wt% of a photosensitive polymer which is obtained by reacting a copolymer of (a) an acid anhydride containing unsaturated double bonds, (b) a compound containing unsaturated double bonds, and (c) a compound containing hydroxyl groups and unsaturated double bonds, based on the total weight of the composition; (ii) 1-200 parts by weight of a diluting agent based on the 100 parts by weight of the photosensitive polymer; (iii) 1-20 parts by weight of a photopolymerization initiator based on the 100 parts by weight of the photosensitive polymer; (iv) 25-1,000 parts by weight of an inorganic powder based on the 100 parts by weight of the photosensitive polymer; and (v) 0.1-5 parts by weight of a stabilizing agent based on the 100 parts by weight of the inorganic powder. Preferably the acid anhydride (a) is maleic anhydride, the compound (b) is selected from styrene, alpha-methylstyrene and isobutylene, and the compound (c) is selected from a monomer which is obtained by reacting hydroxyalkyl(metha)acrylate, (metha)acrylate and caprolactone, and a macro monomer which is obtained by reacting (metha)acrylate and polycaprolactone oligomer.
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