| 摘要 |
PURPOSE: A development processor is provided to remove a remaining resist perfectly and to recover a rinse solution efficiently. CONSTITUTION: A development processor comprises a rinse solution spray nozzle(47) which sprinkles a rinse solution of a high pressure on a substrate after a development process of the substrate. A cover(50) of a box shape has a side wall(50a) and an upper wall(50b) so as to surround a side direction and an upper part of the rinse solution spray nozzle(47). A predetermined gap(d) exists between a lower part of the cover(50) and the substrate(G). The cover(50) temporarily stores the rinse solution sprinkled from the rinse solution spry nozzle(47), and forms a film of the rinse solution on the substrate. |
