| 摘要 |
PROBLEM TO BE SOLVED: To prevent a loss time from being prolonged so much even though an exposure time is prolonged. SOLUTION: As to a work holding base for holding a substrate material P and making the material P opposed to an exposure mask 55; the one 21L exclusive for exposing one exposure surface and the one 21R exclusive for exposing the other exposure surface are provided. Thus, such an operation phase as the receiving, the carrying, the exposing and the previous processing of an unexposed substrate material and that of the substrate material, whose one surface is exposed, can be deviated, so that the loss time for exposure waiting can be prevented from occurring even in the case of only one light source.
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