| 摘要 |
PURPOSE: A substrate for a stencil mask and a fabricating method thereof are provided to realize shorter turn around time(TAT). CONSTITUTION: A substrate(20) for a stencil mask is based on a frame such as SOI(silicon on insulator). While alignment marks are formed on a front side of the frame, a cavity and cutting slits are formed on a back side of the frame. Further, a dry etch stopper is formed on a back side of thinner portion of the frame, exposed to the cavity. The cavity and the cutting slits are then filled with a filling material, and a quartz substrate(11) is successively attached to the frame by an adhesive(9). This substrate(20) is employed for fabrication of the stencil mask. A window pattern is formed in the thinner portion of the frame, and then the quartz substrate(11), the filling material, and so forth are removed.
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