| 摘要 |
PROBLEM TO BE SOLVED: To inhibit the diffusion of an acid into an unradiated part without inhibiting a catalytic reaction in an radiated part by incorporating a specified organic halide, a basic organic compound, an acid precursor and a medium whose solubility to an aqueous alkali solution varies. SOLUTION: The pattern forming material contains an organic halide which generates hydrochloric acid or hydrobromic acid when irradiated, a basic organic compound, an acid precursor which generates an acid other than the haloid acids when radiated and a medium which is not substantially decomposed by the generated haloid acid but substantially decomposed by the acid generated from the acid precursor to vary its solubility to an aqueous alkali solution. The organic halide efficiently forms the haloid acid under radiation and selectively neutralizes the basic organic compound in the radiated part. Since the haloid acid is not formed in the unradiated part and the basic organic compound in the unradiated part is not neutralized, the acid diffused from the radiated part into the unradiated part is captured and the diffusion of the acid into the unradiated part is inhibited. |
