| 摘要 |
PROBLEM TO BE SOLVED: To enhance alkali developability and etching resistance and the like and to enable a minute pattern to be formed by incorporating a specified photopolymerizable urethane compound. SOLUTION: The photosensitive compositions contain the polyurethane compound having structural units each represented by the formula. B-[X]n[Y]m-B, and when needed, another photopolymerizable compound, and in the formula, Y is represented by -OOCHN-A-NHCOO-(R2)-, A is a structural unit derived from a polyisocyanate compound, B is a structural unit derived from a hydroxyl compound having ether bonds having one or more photopolymerizable unsaturated groups on each end, R1 is a structural units derived from a polyol compound having a carboxyl group; and each of (n) and (m) is an integer of 1-10. |
